Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1999-02-18

2000-10-24

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723I, H05H 100

Patent

active

061361402

ABSTRACT:
Disclosed is a plasma processing apparatus, comprising a processing chamber in which an object to be processed is arranged, a processing gas introducing pipe for introducing a processing gas into the processing chamber, an antenna arranged in that region on the outer surface of the processing chamber which is positioned to correspond to the object to be processed, an insulator being interposed between the antenna and the processing chamber, and a high frequency power being supplied to the antenna so as to form an induction electric field near the object to be processed, and a paramagnetic member arranged to overlap at least partially with the antenna.

REFERENCES:
patent: 3886896 (1975-06-01), Van Cakenberghe
patent: 4434742 (1984-03-01), Henaff
patent: 4948458 (1990-08-01), Ogle
patent: 5091049 (1992-02-01), Campbell
patent: 5180435 (1993-01-01), Mankunas
patent: 5277751 (1994-01-01), Ogle
patent: 5304279 (1994-04-01), Coultas
patent: 5401350 (1995-03-01), Patrick et al.
patent: 5433812 (1995-07-01), Cuomo et al.

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