Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1999-04-08
2000-10-03
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
430321, 430945, G11B 726
Patent
active
061271004
ABSTRACT:
The invention relates to a method of manufacturing a stamper with a uniform groove having a width smaller that the beam diameter of the exposure light spot for use with the optical information recording medium. In the method of manufacturing the stamper for exposing and developing the photoresist layer on the glass base plate, a water-soluble resin layer having a film thickness equal to the depth of the groove formed on the surface of the stamper is provided between the glass base plate (master plate) and the photoresist layer. A micro-pattern is formed on the photoresist layer by way of exposing the master plate. The photoresist layer is used as a mask. A micro-pattern is formed on the lower layer (water-soluble resin layer), by etching the water-soluble resin layer. Thereafter, the photoresist layer is removed. In this way, the glass master plate has a micro-pattern formed thereon.
REFERENCES:
patent: 4837130 (1989-06-01), Ohta et al.
patent: 5238786 (1993-08-01), Kashiwagi
McPherson John A.
Ricoh & Company, Ltd.
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