Exposure apparatus

Details Exposure apparatus Exposure apparatus

1994-08-01

1996-09-24

Grimley, Arthur T.

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

355 53, G03B 2752

Patent

active

055595820

ABSTRACT:
An exposure apparatus includes a cleaning tool which is located at a position where it is brought into contact with the entire surface of a wafer holder when a wafer stage moves within a predetermined driving range, and a vertical driving shaft for biasing the cleaning tool against the wafer holder. While the cleaning tool is biased against the wafer holder, the wafer stage is moved within the predetermined driving range, thereby cleaning the wafer holder.

REFERENCES:
patent: 4141180 (1979-02-01), Gill, Jr. et al.
patent: 4383757 (1983-05-01), Phillips
patent: 4558949 (1985-12-01), Uehara et al.
patent: 4650983 (1987-03-01), Suwa
patent: 4849901 (1989-07-01), Shimizu

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1932712