Pedestal-type microlens fabrication process

Details Pedestal-type microlens fabrication process Pedestal-type microlens fabrication process

1985-08-30

1987-08-25

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430323, 430324, 430330, 430394, 350417, G03C 500

Patent

active

046892915

ABSTRACT:
Monolithic microlenses and microlens arrays are manufactured on opto-electronic devices and other substrates by using sharp edge pedestals to confine the lateral flow of a molten lens material. The lens material wets the upper surfaces of the pedestals, but the pedestal edges confine the flow, so the lens material conforms to the shape of the pedestal surface and assumes a semi-arcuate profile due to its surface tension. Spin coating and photolithographic patterning may be employed to form the pedestals and to deposit the lens material thereon. The lens material is melted after being deposited, so the pedestals advantageously are stabilized to prevent them from deforming at the temperature of the molten lens material.

REFERENCES:
Ishihara et al., "A High Photosensitivity IL-CCD Image Sensor with Monolithic Resin Lens Array," Electron Device Meeting, 1983, pp. 497-500.
I. N. Ozerov, et al., "Shaping the Contours of Dies for Manufacturing Lens Arrays Having Spherical Elements," Soviet Journal of Optical Technology (USA), vol. 48, No. 1, Jan. 1981, pp. 49-50.
L. d'Auria, et al., "Photolithographic Fabrication of Thin Film Lenses," Optics Communications, vol. 5, No. 4, Jul. 1972, pp. 232-235.
Oikawa, M. et al., "Array of Distributed-Index Planar Micro-Lenses Prepared from Ion Exchange Technique," Japanese Journal of Applied Physics, vol. 20, No. 4, Apr. 1981, pp. L-296-298.
G. P. Shadurskii et al., "The Effect of Errors in the Fabrication of Lens Array Elements on the Effective Depth of Field," Soviet Journal of Optical Technology, vol. 41, No. 11, Nov. 1974, pp. 507-509.
G. S. Glukhovskiy, et al., "Evaluation of the Integrated Quality of Fine-Structure Lenslet Arrays," Soviet Journal of Optical Technology, vol. 40, No. 7, Jul. 1973, pp. 413-415.
R. Allen et al., "Deep U.V. Hardening of Positive Photoresist Patterns", Journal of the Electrochemical Society, vol. 129, Jun. 1982, pp. 1379-1381.

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