Photosensitive film based on silicon-containing polymer and its

Details Photosensitive film based on silicon-containing polymer and its Photosensitive film based on silicon-containing polymer and its

1985-09-19

1987-08-25

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430914, 430926, 430921, 430925, 430922, 522 15, 522 23, 522 25, 522 31, G03C 1495, G03C 171, G03C 172

Patent

active

046892885

ABSTRACT:
Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components.

REFERENCES:
patent: 4442197 (1984-04-01), Crivello et al.
patent: 4551417 (1985-11-01), Suzuki et al.

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