Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1980-02-29
1981-12-15
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31323131, 315248, 31511151, 315357, 356316, H05H 130
Patent
active
043061753
ABSTRACT:
An induction plasma system includes a plasma chamber, a high frequency electrical coil that surrounds the chamber, and an oscillator for energizing the coil to establish a plasma maintaining condition in the chamber. The oscillator tank circuit includes the coil, and is tuned so that it is essentially at resonance when a plasma condition is established in the chamber. Ignition means is arranged for initiating a plasma condition, and is constructed such that insertion of the ignition means into the chamber in the absence of a plasma condition shifts the impedance condition in the chamber to essentially the same tuned condition that exists when a plasma condition is established in the plasma chamber, but without need to adjust any component of the tank circuit.
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patent: 4002944 (1977-01-01), McNeill et al.
Allemand et al., Design of a Fixed-Frequency Impedance Matching Network, etc., Spectrochim Acta, vol. 33B, 1978, pp. 513-534.
McLean George A.
Schleicher Robert G.
Smith, Jr. Stanley B.
Instrumentation Laboratory Inc.
LaRoche Eugene R.
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