Photomask-forming photographic material and method for producing

Details Photomask-forming photographic material and method for producing Photomask-forming photographic material and method for producing

1977-04-19

1982-12-07

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430 4, 430 5, 430275, 430321, 430323, 430531, 430637, G03C 500

Patent

active

043628079

ABSTRACT:
A photomask-forming photographic material which comprises a transparent support having a masking layer thereon, the masking layer having thereon at least one silver halide emulsion layer either directly or on at least one subbing layer on the masking layer.

REFERENCES:
patent: 1906199 (1933-04-01), Rado
patent: 2882150 (1959-04-01), Van Allan et al.
patent: 2937087 (1960-05-01), Forsgaro
patent: 2999016 (1961-09-01), Beeber et al.
patent: 3484154 (1969-12-01), Swing et al.
patent: 3533795 (1970-10-01), Blaumueller
patent: 3561963 (1971-02-01), Kiba
patent: 3567447 (1971-03-01), Chand
patent: 3639125 (1972-02-01), Chand
patent: 3669665 (1972-06-01), Faigenbaum et al.
patent: 3674492 (1972-07-01), Goldrick et al.
patent: 3754913 (1973-08-01), Takeuchi et al.
patent: 3813255 (1974-05-01), Mannens et al.
patent: 3864132 (1975-02-01), Rasch et al.
patent: 3961962 (1976-06-01), Sato

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