Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1994-07-18
1995-10-24
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430 20, 430313, 430324, 430328, 430329, 430394, 427259, G03F 726
Patent
active
054609224
ABSTRACT:
A method of forming electrode patterns on a substrate. A substrate (30) is patterned with a photoresist layer (14) on the front side so that portions (18) of the substrate are revealed. A metal oxide layer (32) is deposited on the patterned photoresist layer and the revealed portions of the substrate. The patterned photoresist layer is then flood exposed to actinic radiation (19). The photoresist pattern (20) is removed, carrying with it those portions of the metal oxide layer deposited on the photoresist layer, forming an electrode pattern (22) by a lift-off technique.
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IBM Technical Disclosure Bulletin, Fredericks, et al., titled "Polysulfone Lift-Off Masking Technique," IBM Corp., vol. 20, No. 3, Aug., 1977.
IBM Technical Disclosure Bulletin, Dalal, et al., titled "Chrome-Copper-Chrome Lift-Off Process," IBM Corp., vol. 20, No. 38 Jan., 1978.
Arledge John K.
Davis James L.
Swirbel Thomas J.
Dorinski Dale W.
Duda Kathleen
Motorola Inc.
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