Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-06-03
1999-05-04
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 20419232, 148222, 148239, 148218, 427129, 427131, 427130, 427523, 427524, 427527, 427528, 427530, 427531, C23C 1434
Patent
active
059001267
ABSTRACT:
An improved magnetic-recording disk and a process for manufacturing magnetic-recording disks are disclosed. A precision cold-rolled authentic stainless steel is the substrate for a magnetic-recording disk. The surface of the substrate may be hardened by plasma nitriding, plasma carburizing, or plasma carbonitriding. A hard coating may be applied to the substrate by evaporative reactive ion plating or reactive sputtering of aluminum nitride, silicon nitride, silicon carbide, or nitrides, carbides, or borides of titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, or tungsten.
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Nelson Carl W.
Weir Richard D.
McDonald Rodney G.
Nguyen Nam
Tulip Memory Systems, Inc.
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