Photopolymerizable ink compositions

Details Photopolymerizable ink compositions Photopolymerizable ink compositions

1980-07-22

1981-06-02

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430285, 430286, 430288, 20415915, 20415919, 106 20, G03C 168

Patent

active

042712580

ABSTRACT:
A photopolymerizable ink composition containing as essential ingredients (A) a high molecular diacrylate of epoxy resin made of bisphenol A and epichlorohydrin, (B) a urethane modified acrylate resin, (C) a urethane bond-free bifunctional photopolymerizable methacrylate monomer or oligomer, (D) a urethane bond-free polyfunctional photopolymerizable acrylate monomer or oligomer and (E) a photo-initiator, is curable upon short time exposure to ultra-violet irradiation and possesses the electrical, mechanical and chemical properties indispensable to a protective film for use in printed circuit boards.

REFERENCES:
patent: 3772061 (1973-11-01), Shur et al.
patent: 3883352 (1975-05-01), Kloczewski et al.
patent: 4003877 (1977-01-01), Lipson et al.
patent: 4014771 (1977-03-01), Rosenkranz et al.
patent: 4018940 (1977-04-01), Morgan
patent: 4072770 (1978-02-01), Ting et al.
patent: 4168173 (1979-09-01), Pohl
patent: 4169732 (1979-10-01), Shipley

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