X-ray mask blank, X-ray mask and pattern transfer method

Details X-ray mask blank, X-ray mask and pattern transfer method X-ray mask blank, X-ray mask and pattern transfer method

1997-09-04

1998-12-08

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, G03F 116

Patent

active

058481206

ABSTRACT:
There is provided an X-ray mask blank from which an X-ray mask having a remarkably small positional deformation even at a large window size of 50 mm square and a remarkably positional precision can be manufactured. The X-mask blank has an X-ray transparent film on a substrate and an X-ray absorber film on the X-ray transparent film. A product of Young modulus and film thickness of the X-ray transparent film is 6.times.10.sup.8 to 3.times.10.sup.9 dyn/cm.

REFERENCES:
patent: 5291536 (1994-03-01), Itoh et al.
patent: 5607733 (1997-03-01), Fukuda et al.
English abstract: Japanese Published Application No. 53-20767.

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