Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1990-10-02
1992-01-28
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041922, 2041923, C23C 1434
Patent
active
050841521
ABSTRACT:
RF sputtered CoCrTa film deposited on a thin Cr underlayer for longitudinal magnetic recording and the preparation method thereof are disclosed. The film exhibits a (1010) texture which provides a high coercivity of 1190 Oe. The high coercivity is obtained on a 200 A Cr underlayer with a low argon pressure of 4 mtorr and high substrate bias of -100 V.
REFERENCES:
patent: 4552820 (1985-11-01), Lin et al.
patent: 4824724 (1989-04-01), Ueda et al.
patent: 4865878 (1989-09-01), Nagas et al.
patent: 4900397 (1990-02-01), Werner et al.
Industrial Technology Research Institute
Nguyen Nam X.
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