Method for preparing a magnetic recording medium

Details Method for preparing a magnetic recording medium Method for preparing a magnetic recording medium

1987-06-18

1989-09-26

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 2041922, C23C 1434

Patent

active

048697974

ABSTRACT:
A method of preparing a magnetic recording medium in which a magnetic layer is deposited on a non-magnetic support and then a carbon protective layer is sputtered onto the magnetic layer. The sputtering is performed with a bias voltage of -10V to -100V being applied in the vicinity of the support and magnetic layer.

REFERENCES:
patent: 4428810 (1984-01-01), Webb et al.
patent: 4503125 (1985-03-01), Nelson et al.
Brian Chapman, Glow Discharge Processes, John Wiley & Sons, New York, 1980, pp. 215-227.
Leon I. Maissel et al., Handbook of Thin Film Technology, McGraw-Hill Book Co., New York, 1970, pp. 4-22 to 4-25.
Robert W. Berry et al., Thin Film Technology, Van Nostrand Reinhold Co., New York, 1968, pp. 230-233.
John L. Vossen et al., Thin Film Processes, Academic Press, New York, 1978, pp. 50-59.

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