Sputter coating station

Details Sputter coating station Sputter coating station

1996-06-25

1998-05-19

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429811, 20429815, 20429823, 20429824, 20429825, 20429826, C23C 1434, C23C 1435

Patent

active

057530890

ABSTRACT:
A sputter coating station has a pair of opposing sputter sources. At least one of the sources encompasses a clear opening through which a workpiece mounting arrangement holding a workpiece can move for positioning the workpiece through the opening. A process for sputter coating workpieces uses the sputter coating station and includes holding the workpiece by a workpiece holder through the opening and into the coating chamber, and coating the workpiece using the sputtering sources.

REFERENCES:
patent: 3250694 (1966-05-01), Maissel et al.
patent: 3728246 (1973-04-01), Barkhudarov et al.
patent: 4530750 (1985-07-01), Aisenberg et al.
patent: 4558388 (1985-12-01), Graves, Jr.
patent: 4842704 (1989-06-01), Collins et al.
patent: 4915805 (1990-04-01), Rust
patent: 5229358 (1993-07-01), Kumar
European 0489239 of Jun. 1992.

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