Method of growing silicon monocrystalline rod

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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1566207, 15662073, 15662074, 156602, C30B 2906

Patent

active

052580920

ABSTRACT:
The present invention is intended to provide a method of growing a silicon monocrystalline rod by an FZ process, wherein the dopant distribution of the silicon monocrystalline rod in the diametrical direction is made microscopically uniform, characterized in that a magnetic field forming means is arranged above and/or below a melting zone of said silicon monocrystalline rod to surround said silicon monocrystalline rod and a magnetic field is applied to the melting zone of the silicon monocrystalline rod through said magnetic forming means, and preferably the magnetic field forming means is constituted by supplying a direct electric current through a solenoid coil surrounding said silicon monocrystalline rod.

REFERENCES:
patent: 3086856 (1963-04-01), Siebertz
patent: 3211881 (1965-10-01), Jablonski et al.
patent: 3232745 (1966-02-01), Rummel et al.
patent: 3351433 (1967-11-01), Keller
patent: 3607139 (1971-09-01), Hanks
De Leon, "Growth of Homogeneous High Resistivity FZ Silicon Crystals Under Magnetic Filed Bias", J. of Crystal Growth, 55:406-08 (1981).

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