Substrate inspecting apparatus, substrate inspecting system havi

Details Substrate inspecting apparatus, substrate inspecting system havi Substrate inspecting apparatus, substrate inspecting system havi

1999-05-14

2000-03-14

Font, Frank G.

Optics: measuring and testing

Inspection of flaws or impurities

356376, 356334, 356394, G01N 2100

Patent

active

060380187

ABSTRACT:
A substrate inspecting system 60 observes and inspect a semiconductor wafer pattern by irradiating the surface of the semiconductor wafer 11 with electron beams 31, and making a projection unit project in enlargement secondary electrons, reflected electrons and backward scattered electrons generated therefrom in the form of secondary electron beams 32 on an undersurface of an electron beam detecting unit 61, and form an image thereon. The substrate inspecting system 60 includes a parallel-plate type energy filter 33 in a projection system. The present invention discloses a substrate inspecting apparatus capable of detecting a voltage contrast defect on a sample with a high accuracy by separating the secondary electron beams and fetching a secondary electron beam having an energy over a predetermined value, and of quantitatively measuring this defect, a substrate inspecting system having this apparatus, and a substrate inspecting method.

REFERENCES:
patent: 5535006 (1996-07-01), Telschow et al.
patent: 5757474 (1998-05-01), Sopovi et al.

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