Photopolymerizable composition, photopolymerizable lithographic

Details Photopolymerizable composition, photopolymerizable lithographic Photopolymerizable composition, photopolymerizable lithographic

1999-08-16

2000-11-28

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430926, 430302, 522 75, G03F 7028

Patent

active

061533564

ABSTRACT:
A photopolymerizable composition comprising (A) an ethylenically unsaturated compound, (B) a cyanine dye and (C) a photopolymerization initiator, wherein the cyanine dye of component (B) is a cyanine dye of a structure having hetero atoms connected via a polymethine chain, and the polymethine chain has at least one substituent of the following formula (.alpha.): ##STR1## wherein Q.sup.1 and Q.sup.2 are optional substituents, which may be connected to form a ring.

REFERENCES:
patent: 4997745 (1991-03-01), Kawamura et al.
patent: 5219709 (1993-06-01), Nagasaka et al.
patent: 5723260 (1998-03-01), Tsuji et al.
patent: 5738974 (1998-04-01), Nagasaka et al.
patent: 5800965 (1998-09-01), Tsuji et al.
patent: 5814431 (1998-09-01), Nagasaka et al.
patent: 5837422 (1998-11-01), Sasaki et al.

Affiliated with

Also associated with

Rating

Photopolymerizable composition, photopolymerizable lithographic does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photopolymerizable composition, photopolymerizable lithographic , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable composition, photopolymerizable lithographic will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1723528