Imaging medium

Details Imaging medium Imaging medium

1995-04-28

1997-05-20

Letscher, Geraldine

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430269, 430338, 430332, 430340, G03C 1492, G03C 1494, G03C 176

Patent

active

056311184

ABSTRACT:
A process for producing an image uses an imaging medium comprising an acid-generating layer or phase comprising a mixture of a superacid precursor, a sensitizing dye and a secondary acid generator, and a color-change layer comprising an image dye. The sensitizing dye has first and second forms, the first form having substantially greater substantial absorption in a first wavelength range than the second form. The superacid precursor is capable of being decomposed to produce superacid by radiation in a second wavelength range, but is not, in the absence of the sensitizing dye, capable of being decomposed by radiation in the first wavelength range. The secondary acid generator is capable of acid-catalyzed thermal decomposition by unbuffered superacid to form a secondary acid. While at least part of the sensitizing dye is in its first form, the medium is imagewise exposed to radiation in the first wavelength range, thereby causing, in the exposed areas of the acid-generating layer, the formation of unbuffered superacid. The medium is then heated to cause, in the exposed areas, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The components of the acid-generating and color-change layers or phases are then mixed so that the secondary acid causes a change in color of the image dye, and the sensitizing dye is converted to its second form. The acid-generating layer or phase desirably includes a cosensitizer which is a reducing agent less basic than the secondary acid generator.

REFERENCES:
patent: 3617270 (1971-11-01), Kampfer
patent: 3623866 (1971-11-01), Averbach
patent: 3915706 (1975-10-01), Limburg et al.
patent: 3932514 (1976-01-01), Thelen et al.
patent: 4092146 (1978-05-01), Fischer et al.
patent: 4159387 (1979-06-01), Bellus
patent: 4251619 (1981-02-01), Kurita
patent: 4345017 (1982-08-01), Cournoyer et al.
patent: 4508811 (1985-04-01), Gravesteijn et al.
patent: 4602263 (1986-07-01), Borrer et al.
patent: 4720449 (1988-01-01), Borrer et al.
patent: 4826976 (1989-05-01), Borrer et al.
patent: 4857437 (1989-08-01), Banks et al.
patent: 4916046 (1990-04-01), Doessel
patent: 4992571 (1991-02-01), Fukuyama et al.
patent: 5037575 (1991-08-01), Miura et al.
patent: 5055376 (1991-10-01), Saeva
patent: 5084371 (1992-01-01), Schwalm et al.
patent: 5102771 (1992-04-01), Vogel et al.
patent: 5141969 (1992-08-01), Saeva et al.
patent: 5145767 (1992-09-01), Whitcomb et al.
patent: 5153104 (1992-10-01), Rossman et al.
patent: 5153105 (1992-10-01), Sher et al.
patent: 5219703 (1993-06-01), Bugner et al.
patent: 5227498 (1993-07-01), Lee et al.
patent: 5227499 (1993-07-01), McGowan et al.
patent: 5258274 (1993-11-01), Helland et al.
patent: 5286612 (1994-02-01), Telfer
patent: 5314795 (1994-05-01), Helland et al.
patent: 5334489 (1994-08-01), Grasshoff et al.
patent: 5395736 (1995-03-01), Grasshoff et al.
patent: 5445917 (1995-08-01), Grasshoff et al.
Beringer, F.M. et al., J. Am. Chem. Soc., 60, 141 (1956).
Berry et al., Chemically Amplified Resists for I-line and G-line Applications, SPIE 1262, 575 (1990).
Bi, Y. et al., J. Photochem. Photobiol. A: Chem, 74, 221 (1993).
Bou et al., Tetrahedron Letters, 23(3), 361 (1982).
Cohen S. and Cohen, S. G., J. Am. Chem. Soc., 88, 1533 (1966).
Crivello et al., J. Polym. Sci., Polym. Chem. Ed., 16, 2441 (1978).
Dehmlow et al., Chem. Ber. 113(1), 1-8 (1979).
Dehmlow et al., Chem. Ber. 121(3), 569-71 (1988).
Devoe et al., Can. J. Chem., 66, 319 (1988).
Fouassier et al., J. Imag. Sci. Tech., 37(2), 208 (1993).
Islam, N. et al., Tetrahedron 43, 959-970 (1987).
Ito et al., Polymer Sci. Eng., 23(18), 1012 (1983).
Krohnke, Synthesis, 1976, 1.
Mitchell, R.D. et al., J. Imag. Sci., 30(5), 215 (1986).
Ohe, Y. et al., J. Imag. Sci. Tech., 37(3), 250 (1993).
Pappas, S.P. et al., Progress in Organic Coatings, 13, 35 (1964).
Reichmanis et al., Chemical Amplification Mechanism for Microlithography, Chem. Mater., 3(3), 394 (1991).
Pericas et al., Tetrahedron Letters, (1977), 4437-38.
Sabongi, G.J. Chemical Triggering--Reactions of Potential Utility in Industrial Processes, Plenum Press, New York, New York (1987), pp. 68-71 and 97-101.
Wallraff, G.M. et al., J. Imag. Sci. Tech., 36(5), 468 (1992).
Weiss, J. Am. Chem. Soc., 74, 200 (1952).

Affiliated with

Also associated with

Rating

Imaging medium does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Imaging medium, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Imaging medium will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1722972