Dry etching apparatus for rectangular substrate comprising plasm

Details Dry etching apparatus for rectangular substrate comprising plasm Dry etching apparatus for rectangular substrate comprising plasm

1992-09-01

1994-04-26

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 20429837, 20429838, H01L 2100

Patent

active

053063791

ABSTRACT:
A rectangular substrate dry etching apparatus which etches a rectangular substrate of a large size with a high degree of accuracy. The dry etching apparatus comprises an etching chamber in which a rectangular substrate to be etched is held in position in the etching chamber, and a plasma generator disposed in the etching chamber for generating a pair of high density plasma bars on the outer sides of and substantially in parallel to a pair of opposing sides of the rectangular substrate in the etching chamber so as to etch the rectangular substrate with diffusion components of the high density plasma bars.

REFERENCES:
patent: 4745337 (1988-05-01), Pichot et al.
patent: 4996077 (1991-02-01), Moslehi et al
Burke et al., "Microwave Multipolar Plasma for Etching and Deposition", Solid State Technology, Feb. 1988, pp. 67-71.

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