Low ozone depleting organic chlorides for use during silicon oxi

Details Low ozone depleting organic chlorides for use during silicon oxi Low ozone depleting organic chlorides for use during silicon oxi

1992-06-15

1994-02-22

Kunemund, Robert

Fishing, trapping, and vermin destroying

4272553, H01L 2131

Patent

active

052886620

ABSTRACT:
A process for thermal oxidation of silicon or cleaning of furnace tubes used in semiconductor manufacturing by exposing the silicon or tube to temperatures above 700.degree. C. while flowing a carrier gas containing oxygen and a chlorohydrocarbon having a general formula C.sub.x H.sub.x Cl.sub.x where x is 2, 3, or 4 over the silicon or tube. The chlorohydrocarbon is selected to readily and completely oxidize at temperature.

REFERENCES:
patent: 3837905 (1974-09-01), Hile et al.

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