Process for forming deposition film

Details Process for forming deposition film Process for forming deposition film

Filed on

1995-06-06

Date issued

1999-06-08

Examiner

King, Roy V.

Patent Class

Coating processes

SubClass

Direct application of electrical, magnetic, wave, or...

SubSubClass

Plasma

Other Related Categories

427574, 427578, 427580, 427255, 4272551, 4272552, 427314, 4272555, 430128, B06D 306, C23C 1600

Type

Patent

Status

active

Patent number

059103426

Description

ABSTRACT:
A process for forming a deposition film on a substrate comprises introducing separately a precursor or activated species formed in a decomposition space (B) and activated species formed in a decomposition space (C), into the deposition space wherein the film is formed on the substrate.

REFERENCES:
patent: 4430149 (1984-02-01), Berkman
patent: 4479455 (1984-10-01), Doehler et al.
patent: 4702934 (1987-10-01), Ishihara et al.

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