Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1997-05-02

1999-11-30

Phan, James

Optical: systems and elements

Deflection using a moving element

359201, 359202, 355 30, G02B 2608

Patent

active

059952636

ABSTRACT:
A scan type projection exposure apparatus which includes an illumination optical system for forming a slit-shaped illumination area on a pattern on a mask by using illuminating light, and a projection optical system for forming an image of a portion of the pattern in the illumination area on a substrate, includes: a mask stage which moves at least in one direction while holding the mask; a substrate stage which moves two-dimensionally while holding the substrate; a control system for synchronously scanning the mask stage and the substrate stage; and an image forming performance adjusting system for adjusting image forming performance of the projection optical system and having a component placed in an area through which the illuminating light incident from the illumination area on the mask to the projection optical system does not pass.

REFERENCES:
patent: 5105075 (1992-04-01), Ohta et al.

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