Ion plating apparatus that prevents wasteful consumption of evap

Details Ion plating apparatus that prevents wasteful consumption of evap Ion plating apparatus that prevents wasteful consumption of evap

1997-12-05

2000-02-08

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723VE, 20429804, C23C 1600

Patent

active

060217375

ABSTRACT:
A plasma beam is directed towards a hearth to flow electric current of the plasma through the hearth during formation of a thin film on a substrate. The plasma beam is directed towards an auxiliary anode to flow electric current of the plasma through the auxiliary anode during the period after completion of the formation of the thin film on the substrate and before beginning of the formation of a thin film on the subsequent substrate.

REFERENCES:
patent: 5055169 (1991-10-01), Hock, Jr. et al.
patent: 5656138 (1997-08-01), Scobey et al.
patent: 5677012 (1997-10-01), Sakemi et al.

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