Method of manufacturing solid-state devices in which planar dime

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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148 15, 427 85, 427 93, 430296, 430327, 430330, 430967, 430317, 250492A, 250492B, H01L 2172

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042568293

ABSTRACT:
A method of manufacturing a microminiature solid-state device includes first and second exposure steps in which radiation-sensitive material on a solid-state substrate is exposed radiation through a mask pattern to define locations for localized processing. A local processing step between the first and second exposure steps causes an undesired dimensional distortion of the substrate surface in the plane of the substrate surface. This dimensional distortion is then reduced by adjusting the relative sizes of the area of the substrate surface and the area of the mask used in the second exposure step in an substantially uniform manner prior to the second exposure step. By adjusting the relative sizes of the substrate surface and mask areas in such a way as to compensate for the planar dimensional distortion induced in the first exposure step, such dimensional distortion can be substantially reduced.

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patent: 3710101 (1973-01-01), O'Keefe et al.
patent: 3823015 (1974-07-01), Fassett
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patent: 4115120 (1978-09-01), Dyer et al.
O'Keeffe et al., "An Electron Imaging System for the Fabrication of Integrated Circuits, " Solid State Electronics, vol. 12, pp. 841-848, (1969).
Scott, "Photo Cathodes for Use in an Electron Image Projector", Journal of Applied Physics, vol. 46, No. 2, Feb. 1975.
Wardly, Rev. Sci. Instrum., vol. 44, No. 10, Oct. 1973.

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