Method and photoresist using a photoresist copolymer

Details Method and photoresist using a photoresist copolymer Method and photoresist using a photoresist copolymer

1997-12-17

2000-11-07

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 526284, G03F 7004

Patent

active

061434639

ABSTRACT:
There is disclosed a photoresist copolymer for DUV light, with which the fine patterns allowable for the high integration of semiconductor devices can be easily obtained in a microlithography process using DUV light. The copolymer is easily prepared by reacting at least two alicyclic olefins at a high temperature and at high pressure in the presence of an initiator.

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