Electron beam exposure system

Details Electron beam exposure system Electron beam exposure system

1981-10-08

1985-09-24

Blum, Theodore M.

Electric lamp and discharge devices: systems

Cathode ray tube circuits

Cathode-ray deflections circuits

250397, H01J 2958

Patent

active

045435120

ABSTRACT:
An electron beam exposure system has first and second apertures through which is passed an electron beam emitted from an electron gun. A rectangular image formed by superposition of the images formed by the first and second apertures is projected onto a target plane through a third aperture by condenser lenses and projection lenses. When a crossover of the electron beam drifts in the direction perpendicular to the axis of the lens system, the current of the electron beam projected on the target plate decreases. The electron beam current is detected by a faraday cup, and the locus of the electron beam is corrected by a coil assembly interposed between the second and third apertures so that the faraday cup may detect the maximum beam current.

REFERENCES:
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patent: 3795809 (1974-03-01), Takashima
patent: 3900736 (1975-08-01), Michail et al.
patent: 4020343 (1977-04-01), Shimaya et al.
patent: 4321510 (1982-03-01), Takigawa
S. Doran et al., Automatic Stabilization of an Electron-Probe Forming System, IBM, Sep. 1975, J. Vac. Sci. Technol., vol. 12, No. 6, Nov./Dec. 1975, p. 1174.
F. Kurzweil, Jr. et al., Automatic Control of an Electron-Beam Column, IBM.
Elektronik, vol. 8 (Aug. 1977), T. H. P. Chang et al., "Grundlagen und Technik der Elektronenstrahl-Lithografie," pp. 51-60.
IBM Journal of Research and Development, vol. 21, No. 6, (Nov. 1977), D. E. Davis et al., "Automatic Registration in an Electron-Beam Lithographic System," pp. 498-505.
H. C. Pfeiffer, Variable Spot Shaping for Electron-Beam Lithography, Proc. 14th EIP Symp., p. 883 (1978).

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