Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1982-02-24
1984-03-20
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415915, 20415916, 20415918, 20415924, 430284, 430905, 430910, 430916, 430917, 430919, 430920, 430921, 430922, G03C 168
Patent
active
044381905
ABSTRACT:
A photosensitive resin composition comprising (a) at least one compound selected from the group consisting of benzotriazole, benzimidazole, benzothiazole, derivatives thereof and salts thereof, (b) a phosphate compound having photopolymeric unsaturated bonds, (c), if necessary, an organic thermoplastic polymer, (d) a photopolymerizable unsaturated compound having at least one terminal ethylene group and (e) a sensitizer and/or a sensitizer system, and a photosensitive element comprising a layer of said photosensitive resin composition and a support film therefor, are provided. The photosensitive resin composition can form a protective coating film with excellent adhesiveness to the substrate surface, and such a protective coating film or, photosensitive element obtained therefrom can be advantageously used as a resist for soldering mask, etc.
REFERENCES:
patent: 3622334 (1971-11-01), Hurley et al.
patent: 4269931 (1981-05-01), Suzuki et al.
patent: 4272607 (1981-06-01), Tsukada et al.
patent: 4289844 (1981-09-01), Specht et al.
Hayashi Nobuyuki
Ishimaru Toshiaki
Tsukada Katsushige
Brammer Jack P.
Hitachi Chemical Company Ltd.
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