Photopolymerizable composition

Details Photopolymerizable composition Photopolymerizable composition

1988-10-03

1990-08-28

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430914, 430915, 522 31, 522 63, G03F 7027

Patent

active

049524801

ABSTRACT:
Photopolymerization initiator compositions having high photosensitivity to light sources giving visible rays and the other rays in the longer wavelengths. The compositions containing polymerizable compounds having at least one ethylenic unsaturated bond and organic boron compound anionic salts of indolenine dye compounds having at least one electron-attracting group in the nuclei can be used for the production of planographic plates, resin letterpress printing plates and photoresists or photomasks for printed circuit substrates. The polymerizable compounds having at least one ethylenic unsaturated bond can be encapsulated to obtain microcapsules to be used for the formation of black and white or color images.

REFERENCES:
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patent: 4343891 (1982-08-01), Aasen et al.
patent: 4447521 (1984-05-01), Tiers et al.
patent: 4562137 (1985-12-01), Sanders
patent: 4772541 (1988-09-01), Gottschalk et al.
patent: 4788124 (1988-11-01), Wright
patent: 4800149 (1989-01-01), Gottschalk et al.
patent: 4839274 (1989-06-01), Logan
patent: 4874684 (1989-10-01), Yamamoto

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