Wave transmission lines and networks – Automatically controlled systems – Impedance matching
Patent
1996-05-23
1997-11-18
Gensler, Paul
Wave transmission lines and networks
Automatically controlled systems
Impedance matching
364482, H03H 740
Patent
active
056892152
ABSTRACT:
An r.f. field is supplied by a reactive impedance element to a plasma in a vacuum plasma processing chamber. The element and source are connected via a matching network including first and second variable reactances that control loading of the source and tuning a load, including the reactive impedance element and the plasma, to the source. The values of the first and second variable reactances are changed to determine the amount the first variable reactance is to change for each unit change of the second variable reactance to attain the best match between the impedances seen looking into and out of output terminals of the r.f. source. Then the values of the first and second variable reactances are varied simultaneously based on the determination until the best impedance match between the impedances seen looking into and out of output terminals of the r.f. source is attained.
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Barnes Michael S.
Ngo Tuan
Richardson Brett
Gensler Paul
Lam Research Corporation
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