Particle source for a reactive ion beam etching or plasma deposi

Details Particle source for a reactive ion beam etching or plasma deposi Particle source for a reactive ion beam etching or plasma deposi

1989-01-18

1991-01-22

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511121, 31511131, 31511181, 313230, 250423R, H01J 2716, H05H 146

Patent

active

049873466

ABSTRACT:
The invention relates to a particle source with which positive, negative, and neutral particles can be generated and applied on a substrate. The particle source comprises a container (26) in which a gas or gas mixture to be ionized is held. Into this container (26) an electromagnetic wave irradiates which preferably is a microwave. A torus-shaped magnetic field, which is generated with the aid of permanent magnets (32, 33) or electromagnets, simultaneously projects into the container (26). With the aid of a special control grid configuration (38, 39, 40) it becomes possible to draw off positive, negative or neutral particles from the container (26).

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