Process for etching polyimide substrate in formation of unsuppor

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156656, 1566591, 156668, 156902, 252 795, B44C 122, B29C 3700, C23F 102, C03C 1500

Patent

active

049868802

ABSTRACT:
Formation of unsupported electrically conductive leads is obtained by etching of a polyimide substrate using an etching solution with a low etch ratio.

REFERENCES:
patent: 4426253 (1984-01-01), Kreuz et al.
patent: 4650545 (1987-03-01), Laakso et al.
patent: 4681654 (1987-07-01), Clementi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for etching polyimide substrate in formation of unsuppor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for etching polyimide substrate in formation of unsuppor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for etching polyimide substrate in formation of unsuppor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1553647

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.