Method and apparatus for particle irradiation of a target

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250398, H01J 37302

Patent

active

046330909

ABSTRACT:
Method and apparatus for particle irradiation of a target, wherein the anisotropic contrast deflection of an irradiation modulator for producing the exposure pattern is produced step by step, the magnitude of the potential difference between the electrodes of a comb electrode is being set, and the structuring of a line probe is controlled by a control logic according to given specifications by utilization of potential setting patterns.

REFERENCES:
patent: 4130761 (1978-12-01), Matsuda
patent: 4153843 (1979-05-01), Pease
patent: 4472636 (1984-09-01), Hahn

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for particle irradiation of a target does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for particle irradiation of a target, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for particle irradiation of a target will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1548731

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.