Thin film forming apparatus

Details Thin film forming apparatus Thin film forming apparatus

1987-12-16

1991-01-22

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118723, 156613, 156DIG68, 423446, C23C 1648

Patent

active

049862146

ABSTRACT:
A thin film forming apparatus of the present invention comprises: a reaction chamber for receiving therein a substrate and a thin film forming gas; an ultraviolet laser beam oscillator for generating an ultraviolet laser beam for causing dissociation of the thin film forming gas to thereby form a thin film over the surface of the substrate; and a plasma generator for generating ions for controlling growth of a thin film.

REFERENCES:
patent: 4705595 (1987-11-01), Okudaira

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