Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1987-11-20
1989-02-21
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156643, 156644, 156646, 156651, 156653, 156657, 1566591, 156663, 20419237, 252 791, 357 71, 434228, 434240, 434192, B44C 122, C03C 1500, C03C 2506, C23F 102
Patent
active
048070165
ABSTRACT:
An etchant of PSG (14) or BPSG with high selectivity to substantially undoped oxide (12) includes a fluorine-liberating compound and a fluorine-scavenging compound. The fluorine-liberating compound is preferably a perfluorinated inorganic compound, and the fluorine-scavenging compound is preferably a hydrogen-liberating compound such as hydrogen. A particularly preferred inorganic fluorine-liberating compound is nitrogen trifluoride. In an exemplary embodiment, etch rate ratios of PSG to undoped oxide as high as 11 to 1 were obtained.
REFERENCES:
patent: 3700508 (1972-10-01), Keen
patent: 4420503 (1983-12-01), Leung et al.
patent: 4535528 (1985-08-01), Chen et al.
patent: 4634494 (1987-01-01), Taji et al.
patent: 4654112 (1987-03-01), Douglas et al.
Anderson Rodney M.
Heiting Leo N.
Powell William A.
Sharp Melvin
Texas Instruments Incorporated
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