Photosensitive polymer composition

Details Photosensitive polymer composition Photosensitive polymer composition

1992-03-17

1994-03-08

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 522137, 522142, 522162, G03C 1725

Patent

active

052926192

ABSTRACT:
A photosensitive polymer composition comprising, in admixture, a polymer predominantly comprising a recurring unit of the formula (I): ##STR1## wherein x is a tri- or tetravalent organic group, Y is a divalent organic group, and n is equal to 1 or 2 and a compound having a urea bond of the formula (II): ##STR2## wherein R.sup.1 is a group having a functional group capable of forming a dimer or polymer upon exposure to radiation, R.sup.2 and R.sup.3 are independently a hydrogen atom or a monovalent organic group is shelf stable and applicable as relatively thick coatings having sufficient photosensitivity to form semiconductor element surface protective films.

REFERENCES:
patent: 4650849 (1987-03-01), Nishimura et al.
patent: 5019482 (1991-05-01), Ai et al.
Patent Abstracts of Japan, vol. 13, No. 345, p. 909.

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