Process to personalize master slice wafers and fabricate high de

Semiconductor device manufacturing: process – Making device array and selectively interconnecting – With electrical circuit layout

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

438599, H01L 2170

Patent

active

058588175

ABSTRACT:
A method of making gate array ASIC components from a master slice wafer having a first conducting layer containing logic elements, a second conducting layer containing first electrically conducting elements extending in a first direction, and a third conducting layer comprises interconnecting at least some of the logic elements to one another with a single masking process step by defining, on the third conducting layer, second conducting elements connected to the first electrically conducting elements to define connections between the logic elements.

REFERENCES:
patent: 4249193 (1981-02-01), Balyoz et al.
patent: 4295149 (1981-10-01), Balyoz et al.
patent: 4500906 (1985-02-01), Ohno et al.
patent: 4623911 (1986-11-01), Pryor
patent: 4893170 (1990-01-01), Tokuda et al.
patent: 4943841 (1990-07-01), Yahara
patent: 5023701 (1991-06-01), Sharpe-Geisler
patent: 5073729 (1991-12-01), Greene et al.
patent: 5083181 (1992-01-01), Yoshida et al.
patent: 5084404 (1992-01-01), Sharp-Geisler
patent: 5132571 (1992-07-01), McCollum et al.
patent: 5185283 (1993-02-01), Fukui et al.
patent: 5459093 (1995-10-01), Kuroda et al.
Wolf, Silicon processing for the VLSI era, vol. 2, pp. 276-286, 1990.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process to personalize master slice wafers and fabricate high de does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process to personalize master slice wafers and fabricate high de, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process to personalize master slice wafers and fabricate high de will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1514890

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.