Process of depositing a layer of material on a wafer with suscep

Details Process of depositing a layer of material on a wafer with suscep Process of depositing a layer of material on a wafer with suscep

1996-03-27

1998-11-10

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

4272481, 427314, C23C 1600

Patent

active

058340599

ABSTRACT:
The present disclosure is directed to a process of depositing a layer of a material on a wafer, which comprises depositing a layer of the same material to be deposited on the wafer on the back surface of a susceptor.

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