High-frequency feeding method for use in plasma apparatus and de

Details High-frequency feeding method for use in plasma apparatus and de High-frequency feeding method for use in plasma apparatus and de

1990-11-21

1991-12-31

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31323131, 333 32, H05H 124

Patent

active

050774999

ABSTRACT:
In a plasma apparatus, electric power is transmitted from a high-frequency power supply to an electrode in a plasma chamber through a feeding cable. A stub connected to the feeding cable as a matching component removes the capacitive component of the impedance of a plasma produced in the plasma chamber and equalizes the resistive component of the impedance of the plasma to the characteristic impedance of the feeding cable. As a result, the impedance of the plasma and the characteristic impedance of the feeding cable are matched, and the transmitting efficiency of the electric power is enhanced. A phase shift circuit may be used instead of the stub.

REFERENCES:
patent: 3569777 (1971-03-01), Beaudry
patent: 4792732 (1988-12-01), O'Loughlin
patent: 4877999 (1989-10-01), Knapp et al.
patent: 4887005 (1989-12-01), Rough et al.
patent: 4956582 (1990-09-01), Bourassa

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