Vapor feed supply system

Cleaning and liquid contact with solids – Apparatus – With heating – cooling or heat exchange means

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Details

134108, 134902, 1341021, B08B 310

Patent

active

059506466

ABSTRACT:
A vapor feed supply system including a vaporizer device and a method of cleaning a vapor flow region employing such a vaporizer device enables thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device. The method includes defining a cleaning fluid passage having a predetermined withstand pressure by isolating a cleaning region of the vapor flow region, and flowing a cleaning fluid into the cleaning fluid passage under a pressure so as to enable the cleaning fluid to remain in a liquid state at a cleaning temperature of the cleaning region.

REFERENCES:
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patent: 4971087 (1990-11-01), Benedetti et al.
patent: 5362328 (1994-11-01), Gardiner et al.
patent: 5368651 (1994-11-01), Esser
patent: 5431180 (1995-07-01), Stenberg
patent: 5522412 (1996-06-01), Ohba et al.
patent: 5558841 (1996-09-01), Nakagawa et al.
European Patent Office 418,592 Mar. 1991.
New U.S. Patent Application filed Jan. 8, 1998, entitled "Vapor-Phase Film Growth Apparatus and Gas Ejection Head", by Kuniaki Horie et al., Atty. Docket No. 1213/GEB610US.

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