Plasma etching of aluminum

Details Plasma etching of aluminum Plasma etching of aluminum

1982-03-25

1983-03-01

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 1566591, 156665, 204192E, 252 791, C23F 102

Patent

active

043753850

ABSTRACT:
A method of improving uniformity of etching in the plasma etching of a substrate of aluminum and its alloys by supporting the substrate on a getter plate of a metal such as tantalum. The getter plate extends beyond the substrate for a distance sufficient to improve the uniformity of etching across the substrate.

REFERENCES:
patent: 4073669 (1978-02-01), Heinecke et al.
patent: 4148705 (1979-04-01), Battey et al.
patent: 4243506 (1981-01-01), Ikeda et al.
patent: 4333793 (1982-06-01), Lifshitz et al.
patent: 4337132 (1982-06-01), Jones

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