Semiconductor device, method for manufacturing the same, apparat

Details Semiconductor device, method for manufacturing the same, apparat Semiconductor device, method for manufacturing the same, apparat

1996-10-01

1999-11-09

Bowers, Charles

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438632, 438783, 438787, H01L 21316

Patent

active

059813733

ABSTRACT:
A method of manufacturing the semiconductor device comprises elements described below;

REFERENCES:
patent: 5334552 (1994-08-01), Homma
patent: 5683940 (1997-11-01), Yahiro
patent: 5700720 (1997-12-01), Hashimoto
patent: 5703404 (1997-12-01), Matsuura
M. Matsuura et al., "Novel Self-planarizing CVD Oxide for Interlayer Dielectric Applications," IEEE IEDM, 1994, pp. 117-120.

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