Insulated gate semiconductor device structure to prevent a reduc

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257267, 257328, 257329, 257331, 257334, 257339, 438267, 438270, H01L 2976, H01L 2994

Patent

active

058641599

ABSTRACT:
A P.sup.- layer (51) is formed between a P base layer (43) and an N.sup.- layer (42) so as to be in contact with the P base layer (43), facing an insulating film (46) of a trench (45) with the N.sup.- layer (42) between. In the configuration, a depletion layer extends to the P.sup.- layer (51) to relieve an electric field at a tip end portion of the trench (45) and a channel length can be lessened. Therefore, it is possible to provide an insulated gate semiconductor device of high breakdown voltage and low On-resistance.

REFERENCES:
patent: 5001526 (1991-03-01), Gotou
patent: 5082795 (1992-01-01), Temple
patent: 5378911 (1995-01-01), Murakami
patent: 5385853 (1995-01-01), Mohammad
Yilmaz, "Power Metal-Oxide-Semiconductor Field Effect Transistor", World Intellectual Property Organization, PCT, WO 92/14269, Aug. 20, 1992.
IEEE Transactions of Electron Devices, vol. ED-34, No. 11, pp. 2329-2334, Nov. 1987, H.R. Chang, et al., "Self-Aligned UMOSFET's With a Specific On-Resistance of 1 M Omega *CM/SUP 2/".

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Insulated gate semiconductor device structure to prevent a reduc does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Insulated gate semiconductor device structure to prevent a reduc, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Insulated gate semiconductor device structure to prevent a reduc will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1452334

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.