Method for producing a .lambda./4 shift type diffraction grating

Details Method for producing a .lambda./4 shift type diffraction grating Method for producing a .lambda./4 shift type diffraction grating

1989-12-08

1991-06-18

Schor, Kenneth M.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156652, 156655, 156657, 1566611, 427162, 427 431, 350320, 35016217, 35016223, H01L 21308

Patent

active

050247263

ABSTRACT:
A method for producing a .lambda./4 shift type diffraction grating by producing a diffraction grating pattern on a substrate with a material capable of being selectively etched relative to the substrate, depositing a resist to bury the diffraction grating pattern, removing a portion of the resist to expose at least a portion of the surface of the diffraction grating pattern, removing the diffraction grating pattern on a first portion of the substrate, etching the first portion of the substrate using the remaining resist pattern as a mask, and etching a second portion of the substrate adjacent to the first portion using the remaining diffraction grating pattern on the second portion of the substrate, thereby producing a .lambda./4 shift type diffraction grating having a .lambda./4 phase shift region at the junction of the first and second portions of the substrate.

REFERENCES:
patent: 4774164 (1988-09-01), Peavey et al.
patent: 4782035 (1988-11-01), Fujiwara
patent: 4792197 (1988-12-01), Inoue et al.
patent: 4806442 (1989-02-01), Shirasaki et al.
patent: 4806454 (1989-02-01), Yoshida et al.
patent: 4842633 (1989-06-01), Kuribayashi et al.

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