Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent
1996-04-29
1998-12-29
Niebling, John
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
438620, 438598, 438637, 438666, 438669, H01L 214763
Patent
active
058541284
ABSTRACT:
An embodiment of the present invention discloses a memory device having an array with digit lines arranged in complementary pairs, the array comprising; a substantially planar layer having trenches therein; a first level of digit lines residing at least partially in the trenches; a second level of digit lines residing on the surface of the layer, the second level extending in generally parallel relation to the digit lines in the first level. The first level of digit lines are in alternating positions with the second level of digit lines and the alternating positions comprise a repeating pattern of a first complementary pair of digit lines at the first level adjacent a second complementary pair of digit lines at the second level.
REFERENCES:
patent: 3945647 (1976-03-01), Takemoto et al.
patent: 4497890 (1985-02-01), Helbert
patent: 4585515 (1986-04-01), Maa
patent: 4789648 (1988-12-01), Chow et al.
patent: 4801554 (1989-01-01), Gobrecht et al.
patent: 4933303 (1990-06-01), Mo
patent: 5266521 (1993-11-01), Lee et al.
patent: 5346587 (1994-09-01), Doan et al.
patent: 5529955 (1996-06-01), Hibino et al.
patent: 5561082 (1996-10-01), Matsuo et al.
patent: 5627094 (1997-05-01), Chan et al.
Ma Kin F.
Stubbs Eric T.
Gurley Lynne A.
Micro)n Technology, Inc.
Niebling John
LandOfFree
Method for reducing capacitive coupling between conductive lines does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for reducing capacitive coupling between conductive lines, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for reducing capacitive coupling between conductive lines will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1424133