X-ray lithography mask and method for producing same

X-ray or gamma ray systems or devices – Specific application – Lithography

Patent

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378210, G21K 500

Patent

active

051114917

ABSTRACT:
An X-ray lithography mask comprising a X-ray transparent film made from diamond, X-ray absorber patterns deposited on the X-ray transparent film and diamond crosspieces shaped on the diamond X-ray transparent film for reinforcing the diamond X-ray transparent film. Since both the transparent film and the reinforcing crosspieces are made from diamond, no thermal stress is induced by the change of temperature. The mask excels in transmittance for X-ray, flatness and strength.

REFERENCES:
patent: 4436797 (1984-03-01), Brady et al.
patent: 4604292 (1986-08-01), Evans et al.

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