Photosensitive amhilphilic high polymers and process for produci

Details Photosensitive amhilphilic high polymers and process for produci Photosensitive amhilphilic high polymers and process for produci

1989-10-25

1991-08-27

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430283, 528350, 528353, 528188, 528125, G03C 173, G03F 7039

Patent

active

050432486

ABSTRACT:
A photosensitive amphiphilic high polymer comprises a linear recurring unit containing at least divalent 1st organic group (R.sup.1) having at least two carbon atoms and at least divalent 2nd organic group (R.sup.2) having at least two carbon atoms, said organic groups R.sup.1 and R.sup.2 being connected to each other by a divalent linkage group formed by a reaction of an acid group (A) containing a hetero atom and a basic group (B) containing a hetero group; and at least one hydrocarbon-containing group having 10 to 30 carbon atoms, which may have a substituent, bonded to said recurring unit by a covalent bond or an ionic bond; and a dimerizable or polymerizable unsaturated bond or an orthonitrobenzyl group ##STR1## which may have a substituent, contained in a part or the whole of said recurring unit.

REFERENCES:
patent: 4022732 (1977-05-01), Schwarcz
patent: 4239880 (1980-12-01), Darms
patent: 4243743 (1981-01-01), Hiramoto et al.
patent: 4321319 (1982-03-01), Shoji et al.
patent: 4416973 (1983-11-01), Goff
patent: 4430481 (1984-02-01), Goff
patent: 4551522 (1985-11-01), Fryd et al.
patent: 4579809 (1986-04-01), Irving
patent: 4595745 (1986-06-01), Nakano et al.
patent: 4801420 (1989-01-01), Uekita et al.
patent: 4822853 (1989-04-01), Uekita et al.
Patent Abstracts of Japan, vol. 7, No. 127 (P-201) [1272], 3rd Jun. 1983.
Chemical Abstracts, vol. 100, No. 10, 5th Mar. 1984, p. 10, Abstract No. 68897m, Columbus, Ohio, U.S.; A. I. Volozhin et al.
Chemical Abstracts, vol. 102, No. 26, 1st Jul. 1985, p. 6, abstract No. 221283w, Columbus, Ohio, U.S.; L. Minnema et al.
Alan K. Engel, Tomoko Yoden, Kohai Sanui, and Naoya Ogata, J. Am. Chem. Soc. (1985), 107, 8308-8310.
M. Suzuki, M. Kakimoto, T. Konishi, Y. Imai. M. Iwamoto and T. Hino, Chemistry Letters, (1986), 395-398.
M. Kakimoto, M. Suzuki, T. Konishi, Y. Imai, M. Iwamoto and T. Hino, Chemistry Letters, (1986), 823-826.
Alan K. Engel, Tomoko Yoden, Kohei Sanui and Naoya Ogata, Polymeric Materials Science and Engineering, 54, (1986), 119-123.
P. S. Vincett and G. G. Roberts, Thin Solid Films, 68, (1980), 135-171.

Affiliated with

Also associated with

Rating

Photosensitive amhilphilic high polymers and process for produci does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive amhilphilic high polymers and process for produci, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive amhilphilic high polymers and process for produci will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1413550