Composition for treating copper and copper alloy surfaces and me

Coating processes – With post-treatment of coating or coating material – Heating or drying

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427 96, 4273884, B05D 302, B05D 512

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active

054965900

ABSTRACT:
A composition for treating surfaces of copper and copper alloys comprising a specific imidazole derivative and water, and an acid or a water-soluble solvent. The composition can produce a heat resistant organic film with superior solderability when applied to surfaces of copper or copper alloys. It is particularly useful as a rust preventing agent for printed-wiring boards.

REFERENCES:
patent: 3645772 (1972-02-01), Jones
patent: 4098720 (1978-07-01), Hwa
patent: 4612049 (1986-09-01), Berner et al.
patent: 4812363 (1989-03-01), Bell et al.
patent: 5064723 (1991-11-01), Lawson
patent: 5089304 (1992-02-01), Kuder
patent: 5211881 (1993-05-01), Muller et al.
patent: 5275694 (1994-01-01), Yamaguchi et al.
Chemical Abstract No. 120:206406 of JP 04080374, Yoshioka et al, Mar. 1992.
Chemical Abstract No. 115:118782 of EP 428383, Kinoshita et al, May 1991.
Chemical Abstract No.: 120:250949 of JP 06002158, Kikukawa et al, Jun. 1992.
Database WPI, Derwent Publication Ltd., AN 93-232820, JP-A-5 156 475, Jun. 22, 1993.
Database WPI, Derwent Publications Ltd., AN 93-270088, JP-A-5 186 888, Jul. 27, 1993.

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