Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-09-01
1990-07-31
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
333 172, 427123, 427125, 4271261, 4271266, H01P 1218
Patent
active
049448579
ABSTRACT:
A plurality of frequency selective limiting (FSL) units are concurrently prepared on a common substrate by depositing a first ferrite member onto a metallized surface of the substrate. The first ferrite member is formed by sputtering a first ferrite film onto the metallized surface and subsequently growing a ferrite layer thereon. A plurality of signal carrying conductors are positioned in spaced relation on the first ferrite member. A second ferrite member is deposited on top in the same manner as the first ferrite member. The overall structure is diced into individual units that are then metallized thereby providing a plurality of FLS's.
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Kaplan G. L.
Sutcliff W. G.
Westinghouse Electric Corp.
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