Flexure stage alignment apparatus

Details Flexure stage alignment apparatus Flexure stage alignment apparatus

1983-12-21

1987-09-15

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Lithography

2504922, G05G 1100

Patent

active

046944770

ABSTRACT:
An apparatus for micropositioning an X-ray lithography mask has but a single stage plate for supporting the mask, three piezoelectric transducers for moving the stage plate in the X-Y plane, and three flexure assemblies located equiangularly around the stage plate for supporting the stage plate and for moving the stage plate in the Z-axis. The flexure assemblies each include a single piezoelectric transducer and various flex strips to allow relative motion of the stage plate to occur smoothly in all six of the possible degrees of freedom.

REFERENCES:
patent: 4525852 (1985-06-01), Rosenberg
patent: 4528451 (1985-07-01), Petric et al.
F. E. Scire et al., "Piezodriven 50-.mu.m Range Stage with Subnanometer Resolution," Rev. Sci. Instrum., vol. 49, No. 12, Dec. 1978, pp. 1735-1740.
S. Yamazaki et al., "X-Ray Exposure System Using Finely Position Adjusting Apparatus," J. Vac. Sci. Technol., vol. 15, No. 3, May/Jun. 1978, pp. 987-991.
Pending application Ser. No. 435,177, filed Oct. 19, 1982.

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