Photosensitive resin composition

Details Photosensitive resin composition Photosensitive resin composition

1994-02-14

1996-04-09

Jagannathan, Vasu S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

525 59, 525 71, 525259, 430176, 522 6, G03C 173

Patent

active

055060897

ABSTRACT:
A universal method to make photosensitive polymers from poly(vinyl alcohol) and poly(vinyl pyridine) is disclosed which generally does not require final purification and can produce photosensitive polymers which are of similar photosensity whether prepared with a poly(vinyl alcohol) or poly(vinyl pyridine) backbone. These polymers comprise a heterocyclic, light-sensitive pendant group including a moiety having the formula: ##STR1## wherein Z.sup.1 denotes the atoms necessary to form a substituted or unsubstituted aromatic heterocyclic ring; Z.sup.2 denotes the atoms necessary to form a substituted or unsubstituted aromatic or aromatic heterocyclic ring; R is hydrogen or a substituted or unsubstituted alkyl group; M is a divalent organic moiety; Y is a residue from a grafting group that is capable of grafting the pendant group onto a polymeric backbone.

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